posted on 2013-09-01, 00:00authored byChun Chia Tan, Luping Shi, Rong Zhao, Qiang Guo, Yi Li, Yi Yang, Tow Chong Chong, Jonathan MalenJonathan Malen, Wee-Liat Ong, Tuviah E. Schlesinger
A compositionally matched superlattice-like (SLL) structure comprised of Ge2Sb2Te5 (GST) and nitrogen-doped GST (N-GST) was developed to achieve both low current and high endurancePhase Change Random Access Memory (PCRAM). N-GST/GST SLL PCRAM devices demonstrated ∼37% current reduction compared to single layered GST PCRAM and significantly higher write/erase endurances of ∼108 compared to ∼106 for GeTe/Sb2Te3 SLL devices. The improvements in endurance are attributed to the compositionally matched N-GST/GST material combination that lowers the diffusion gradient between the layers and the lower crystallization-induced stress in the SLL as revealed by micro-cantilever stress measurements.